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| Sample
Fast Entry Unit |
 |
Material : 316 stainless
steel |
|
Dimension : approx. 150(W)
X 85(H) X 280(D) |
|
Substrate size : Max.
2 inch wafer |
|
Unique sample loading
by a two-axis rotary drive |
| |
|
| Pumping
Chamber |
|
Material : 316 stainless
steel |
|
Dimension : 152mm O.D
/ 146mm I.D, approx. 210mm height |
|
All necessary parts for
vacuum gauge tubes, baratron gauge are
provided |
| |
|
| Microwave
Plasma Source Package(standard 2.0kW
version) |
|
Complete with 2kW, 2.45GHz
microwave power supply, remote microwave
power head,
isolator, 3 stub tuner, directional
coupler with galvanometer, plasma applicator
and
microwave leak detector. |
|
Power Generator / Power
Head |
| |
- Max. Power
: 2kW
- Frequency : 2.45GHz
- Output power is variable from 10%
of the max. rated power
- Including magnetron, filament transformer,
thromoswitch on magnetron, are detector
|
|
Isolator (Circulator with
water load) |
| |
- Frequency
: 2.45GHz / ±10
- Rated forward power : 3kW
- Rated reflected power : 3kW
- Isolation : 20dB
- Cooling type : Water cooling |
|
Three Stub Tuner |
| |
- Frequency : 2.45GHz
(±25)
- Minimize the amount of reflected power
|
|
Dual Directional Coupler |
| |
- Frequency : 2.45 GHz(±25)
- Directivity : > 20dB
- Including Galvanometer for measurement
of forward / reflected power
|
| |
|
| Manipulating
substrate heater stage |
|
Max temperature : 900℃ |
|
Heater material : Graphite |
|
Substrate Holder : 2 inch
diameter of Graphite |
|
Up/Down movement : Total
4 inch travel |
|
Temperature sensor : K-type
Nude thermocouple |
|
Mounting flange : 8 inch
CF flange |
|
Complete with position
sensor, temperature controller. |
| |
|
| Gas
Inlet System |
|
Gas inlet port : 1/4"
VCR fitting |
|
Mounting flange : 8 inch
CF flange |
|
Complete with gas showering,
water cooling device and microwave window |
| |
|
| Vacuum
measurement / pumping |
| |
Ultimate pressure : 2
x 10-3 Torr |
|
Pumping : By 2-stage,
direct-driven, Rotary Vane Pump |
|
Vacuum measurement : capacitance
manometer and convectron vacuum gauge
controller |
|
Complete with manual needle
valve for pressure control, isolation
valves and filter |
| |
|
| Touch
Screen control/ PLC control |
|
Mano-frame Bench for microwave
plasma system hardware and all electronics |
|
Heavy-duty supporting
device for lift up/down of microwave
plasma source package |
|
Includings air pressure
manifold, cooling water manifold with
limit switches |
| |
|
| System
Option |
|
High Power Microwave Source
Upgrading(3kW/6kW) Complete with cooling
facilities of substrate heating stage |
|
Substrate DC bias package
Complete with 1kW DC power supply, power
feedthrough and connectors, cables |
|
Additional Gas inlet system
(upto 5 channels)
High vacuum pumping option (Turbo molecular
pump) |
| |
|
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| |
|
 |
 |
SEM of Diamond Films
on
Si-wafer substrate
|
SEM of vertically aligned carbon
NanoTube synthesized on Ni films |
| |
|
 |
 |
TEM image of CNT
wall
growned by MPECVD |
AFM image of carbon NanoTube
synthesized on Ni films |
|
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