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Vacuum
Probing System For Device, Chips,
Wafer Testing In Variable
Temperature and Variable Gas Atmosphere |
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| The
OmniProbe Philosophy |
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OmniProbe
has been designed for providing
the measurements of electrical
and material
characteristics of Display Devices
such as OLED, LCD, PDP, Solar
Cell, LED, Wafers and
Special Chips under the vacuum
circumstance or various gas atmosphere
with variable
temperature from 150K to 600K |
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OmniProbe
has DOUBLE MOVEMENT facilities
of X & Y coarse moving of
sample stage
in the system vacuum chamber and
3-Axis( XYZ ) fine positioning
movement by
4 MicroPositioner installed on
top hinged door.
Through this unique transfer/
positioning design by both of
sample movement via XY
substrate stage in the vacuum
chamber and probe tip positioning
via outside XYZ
micropositioners, Precise Fast
and Soft tip approach to the analysis
position of
the sample can be allowed.
Especially, the system gives much
technical and mechanical advantages
of eliminating
an inaccurate tip positioning,
difficult tip transfer to the
analysis region, sample damage
which are the mechanical limitation
of the existing various other
vacuum probe stations
by using a long distance bellow
as a probe tip movement device. |
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OmniProbe
has a 100 x 100 mm rectangular
large sample stage allows to mount
a large
sample of upto 4 inch wafers as
well as a lots of different small
samples simultaneously
on the entire sample stage area
which gives a big advantage of
Multi Sample Measurement
without vacuum breaking and Various
Gas Atmospheric Measurement with
variable
temperature of samples. |
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| OmniProbe
Family |
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OmniProbe VHC / Temperature
Range from 150K to 600K |
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OmniProbe VH / Temperature
Range from RT to 600K |
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OmniProbe VC / Temperature
Range from 150K to RT |
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| OmniProbe
Configuration |
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Vacuum Chamber of Anodized
Aluminum |
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Vacuum Measurement Unit |
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Vacuum Pumping System |
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Heat/Cool Substrate Stage |
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Gas Admission Unit for
2 Different Gases |
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XY Coarse Movement |
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XYZ MicroPositioner with
Fine Movement |
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Probe Tip Holder with
BNC Connector |
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Temperature Controller |
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CCD Camera with magnification
lens |
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Main System Controller |
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| OmniProbe
OPTIONS |
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150 x 150 mm, 6 inch wafer
sample stage system |
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High Vacuum Pumping option |
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Additional Gas Inlet for
upto 5 gases |
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Optical Microscope |
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Anti-Vibration Optical
Table ( 800 x 800 mm ) |
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Vacuum Triaxial Connectors |
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19 inch LCD Monitor option |
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| OmniProbe
Technical data |
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Vacuum Chamber |
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Dimension : 350(W) x 350
(D) x 150 (H) mm
Guranteed Base pressure
: 5 x 10-6 Torr
Material : Aluminum, Anodized |
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Vacuum Pump
/ Measurement |
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200 LPM Direct Driven
Rotary Pump as a standard
Convectron Vacuum Gauge
tube with controller
Optional Micro Ion Gauge
with controller (HV option) |
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XY Coarse
Movement |
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X-axis : ± 50 mm, Total
100 mm
Y-axis : ± 50 mm, Total
100 mm |
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XYZ Movement
Micro Positioner |
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X-axis : ± 5 mm with
1 um resolution
Y-axis : ± 5 mm with 1 um
resolution
X-axis : ± 5 mm with 1 um
resolution
Number of Micropositioner
: 4 |
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Substrate
Stage |
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Substrate Size : 100mm x 100mm (VHC/VH Version)
50mm Diameter (VC Version)
Temperature Range : 200K - 600K (VHC Standard Version)
150K - 600K (VHC Low Temp. Version)
RT - 600K (VH Version)
100K - RT (VC Version)
Temperature Uniformity :
3% of full scale
Temperature Stability :
1℃
Heating Ramp-up : Max. 3℃/sec
Heating : By Ceramic Plate
Heater
Cooling : By LN2 Cooling |
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Leakage Performance
: Less than 50 fA. |
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CCD Camera |
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Type : Super
HAD Color CCD, Better than
400K Pixel
Min. illumination : 0.002
Lux
Complete with magnification
lens |
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Optical Stereo
Microscope Option |
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Eye Piece : 20X, 30X
Zoom : 0.75 - 5X
Magnification Range : 15
- 100X, 22.5 - 150X |
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High Vacuum Pump Option |
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Pump : 80 L/S Turbo Molecular pump
Vacuum Measurement : By a Micro ion gauge controller
Complete with High Vacuum Gate Valve |
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